Lithographic processing of polymers using plasma-generated electron beams
| dc.contributor.author | Caolo, Mary Ann, author | |
| dc.contributor.author | Hiraoka, Hiroyuki, author | |
| dc.contributor.author | Collins, George J., author | |
| dc.contributor.author | Yu, Zengqi, author | |
| dc.contributor.author | Krishnaswamy, Jayaram, author | |
| dc.contributor.author | Li, Lumin, author | |
| dc.contributor.author | IEEE, publisher | |
| dc.date.accessioned | 2007-01-03T07:27:53Z | |
| dc.date.available | 2007-01-03T07:27:53Z | |
| dc.date.issued | 1990 | |
| dc.description.abstract | Pattern definition in polymer films is achieved using electron beams generated in soft vacuum (0.05-0.50 torr) glow discharges either on a continuous or pulsed (20-100 ns) basis. With the continuous- mode electron beam, 7- µm transmission mask features are replicated in both polymethyl methacrylate (PMMA) and polyimide resists. Using a pulsed electron-beam submicron (~0.5 µm) features are transferred from an electron-transmitting stencil mask into the PMMA. The soft-vacuum pulsed electron beam is also eminently suited for polymer stabilization. Pulsed electron-beam hardening of 0.05-3.5- µm-thick AZ-type and MacDermid resist patterns is also demonstrated with hardened resist patterns stable to temperatures between 200° and 350°C. The demonstrated replication and pattern stabilization technique may be applicable in microelectronics packaging lithography where the resist thickness is substantial, linewidths are 1-10 µm, and registration requirements are less stringent. | |
| dc.description.sponsorship | This work was supported by the National Science Foundation (Quantum Electrorncs Waves and Beams) under Contract No. ECS-8815051, the Colorado Advanced Technology Institute, the Hewlett Packard Corporation, the Applied Electron Corporation, the IBM Corporation, and by MIS Buckbee-Mears of St. Paul, MN. | |
| dc.format.medium | born digital | |
| dc.format.medium | articles | |
| dc.identifier.bibliographicCitation | Li, Lumin, et al., Lithographic Processing of Polymers Using Plasma-Generated Electron Beams, IEEE Transactions on Plasma Science 18, no. 2 (April 1990): 198-209. | |
| dc.identifier.uri | http://hdl.handle.net/10217/628 | |
| dc.language | English | |
| dc.language.iso | eng | |
| dc.publisher | Colorado State University. Libraries | |
| dc.relation.ispartof | Faculty Publications | |
| dc.rights | ©1990 IEEE. | |
| dc.rights | Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright. | |
| dc.subject | electron beam lithography | |
| dc.subject | plasma applications | |
| dc.subject | polymer films | |
| dc.title | Lithographic processing of polymers using plasma-generated electron beams | |
| dc.type | Text |
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