Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
| dc.contributor.author | Rocca, Jorge J., author | |
| dc.contributor.author | Menoni, Carmen S., author | |
| dc.contributor.author | Parkinson, Bruce Alan, author | |
| dc.contributor.author | Lu, Yunfeng, author | |
| dc.contributor.author | Pietrasanta, L., author | |
| dc.contributor.author | Ludueña, S., author | |
| dc.contributor.author | Marconi, Mario Carlos, author | |
| dc.contributor.author | Grisham, Michael Eric, author | |
| dc.contributor.author | Vaschenko, Georgiy O., author | |
| dc.contributor.author | Capeluto, Maria G., author | |
| dc.contributor.author | IEEE, publisher | |
| dc.date.accessioned | 2007-01-03T04:17:33Z | |
| dc.date.available | 2007-01-03T04:17:33Z | |
| dc.date.issued | 2006 | |
| dc.description.abstract | We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications. | |
| dc.description.sponsorship | This work was supported by the National Science Foundation (NSF) Engineering Research Center (ERC) for Extreme Ultraviolet Science and Technology under NSF Award EEC-0310717, by the Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET), and by the W. M. Keck Foundation. | |
| dc.format.medium | born digital | |
| dc.format.medium | articles | |
| dc.identifier.bibliographicCitation | Capeluto, Maria G., et al., Nanopatterning with Interferometric Lithography Using a Compact λ = 46:9-nm Laser, IEEE Transactions on Nanotechnology 5, no. 1 (January 2006): 3-7. | |
| dc.identifier.uri | http://hdl.handle.net/10217/2128 | |
| dc.language | English | |
| dc.language.iso | eng | |
| dc.publisher | Colorado State University. Libraries | |
| dc.relation.ispartof | Faculty Publications | |
| dc.rights | ©2006 IEEE. | |
| dc.rights | Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright. | |
| dc.subject | nanotechnology | |
| dc.subject | photolithography | |
| dc.subject | x-ray lasers | |
| dc.subject | x-ray lithography | |
| dc.title | Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser | |
| dc.type | Text |
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