Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses
| dc.contributor.author | Artioukov, I. A., author | |
| dc.contributor.author | Vinogradov, A. V., author | |
| dc.contributor.author | Kondratenko, V. V., author | |
| dc.contributor.author | Sevryukova, V. A., author | |
| dc.contributor.author | Voronov, D. L., author | |
| dc.contributor.author | Zubarev, E. N., author | |
| dc.contributor.author | Pershyn, Yu. P., author | |
| dc.contributor.author | Rocca, Jorge J., author | |
| dc.contributor.author | Menoni, C. S., author | |
| dc.contributor.author | Vaschenko, G., author | |
| dc.contributor.author | Grisham, M., author | |
| dc.contributor.author | Optical Society of America, publisher | |
| dc.date.accessioned | 2007-01-03T08:10:18Z | |
| dc.date.available | 2007-01-03T08:10:18Z | |
| dc.date.issued | 2004 | |
| dc.description.abstract | The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of ~0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications. | |
| dc.format.medium | born digital | |
| dc.format.medium | articles | |
| dc.identifier.bibliographicCitation | Grisham, M., et al., Damage to Extreme-Ultraviolet Sc/Si Multilayer Mirrors Exposed to Intense 46.9-nm Laser Pulses, Optics Letters 29, no. 6 (March 15, 2004): 620-622. | |
| dc.identifier.uri | http://hdl.handle.net/10217/67841 | |
| dc.language | English | |
| dc.language.iso | eng | |
| dc.publisher | Colorado State University. Libraries | |
| dc.relation.ispartof | Faculty Publications | |
| dc.rights | ©2004 Optical Society of America. | |
| dc.rights | Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright. | |
| dc.title | Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses | |
| dc.type | Text |
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