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Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography

dc.contributor.authorRocca, Jorge J., author
dc.contributor.authorMenoni, C. S., author
dc.contributor.authorMarconi, M. C., author
dc.contributor.authorCapeluto, M. G., author
dc.contributor.authorWachulak, P. W., author
dc.contributor.authorOptical Society of America, publisher
dc.date.accessioned2007-01-03T08:10:06Z
dc.date.available2007-01-03T08:10:06Z
dc.date.issued2007
dc.description.abstractArrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up.
dc.format.mediumborn digital
dc.format.mediumarticles
dc.identifier.bibliographicCitationCapeluto, M. G., et al., Scanning Mechanism Based on a Programmable Liquid Crystal Display, Optics Express 15, no. 6 (March 19, 2007): 3465-3469.
dc.identifier.urihttp://hdl.handle.net/10217/67583
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartofFaculty Publications
dc.rights©2007 Optical Society of America.
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.titlePatterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
dc.typeText

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