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Etching of polycrystalline diamond films by electron beam assisted plasma

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dc.contributor.authorRocca, Jorge J., author
dc.contributor.authorNishimura, Kozo, author
dc.contributor.authorMiyata, Koichi, author
dc.contributor.authorMiyauchi, Sihigeaki, author
dc.contributor.authorKobashi, Koji, author
dc.contributor.authorMaterials Research Society, publisher
dc.date.accessioned2007-01-03T08:10:06Z
dc.date.available2007-01-03T08:10:06Z
dc.date.issued1996
dc.description.abstractPolycrystalline diamond films were processed in a direct current plasma produced by a self-focused electron beam using combinations of H2, O2, and He as the processing gas. The film surfaces were observed by scanning electron microscopy, and characterized by x-ray photoelectron spectroscopy. It was found that for the case in which O2 was included in the processing gas, a high density of etch pits appeared on (100) faces of diamond grains, and oxygen was either physisorbed or chemisorbed at the film surface. It was demonstrated that the etching apparatus used was capable of forming at least a 5-μm wide pattern of polycrystalline diamond film.
dc.format.mediumborn digital
dc.format.mediumarticles
dc.identifier.bibliographicCitationKobashi, Koji, et al., Etching of Polycrystalline Diamond Films by Electron Beam Assisted Plasma, Journal of Materials Research 11, no. 11 (November 1996): 2744-2748.
dc.identifier.urihttp://hdl.handle.net/10217/67614
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartofFaculty Publications
dc.rights©1996 Materials Research Society.
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.titleEtching of polycrystalline diamond films by electron beam assisted plasma
dc.typeText

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