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Thermoelectric properties of Si/SiC thin-film superlattices grown by ion beam sputtering

dc.contributor.authorCramer, Corson Lester, author
dc.contributor.authorWilliams, John, advisor
dc.contributor.authorSampath, Walajabad, committee member
dc.contributor.authorNeilson, James, committee member
dc.date.accessioned2015-08-27T03:56:48Z
dc.date.available2015-08-27T03:56:48Z
dc.date.issued2015
dc.description.abstractThere are many mechanical systems that convert heat to work and processes that utilize heat including power plants, automobiles, and foundries. Most of these systems expel large amounts of waste heat to the environment that goes unused. One way of recovering the waste heat is to use a solid-state energy converter based on thermoelectric processes. Nano-scaled materials are of interest for use in thermoelectric devices because their properties enhance the efficiency over those obtained using bulk materials. Some nano-scaled materials systems being considered are thin-film superlattices that utilize quantum confinement effects. Thin-film, superlattice thermoelectric devices could revolutionize traditional heat-to-work systems and heat-only processes if they are coupled to the systems to recycle a fraction of the waste heat into usable power. The advantage of thermoelectrics over traditional mechanical systems is that they use solid-state processes instead of moving parts and working fluids. As a result, they can be made to be more reliable and require less maintenance. This thesis focuses on the characterization of a thin-film, superlattice (SL) thermoelectric material formed by alternating silicon and silicon carbide layers to form an n-type quantum well. Superlattices of 31 bi-layers of Si/SiC (10 nm each) were deposited on silicon, quartz, and mullite substrates using a high-speed, ion-beam sputter deposition process, and the Seebeck coefficient and electrical resistivity are measured as a function of temperature and used to compare film performance. In addition, SL layer thicknesses of 2 and 5 nm were deposited on mullite to determine the effect layer thickness has on the thermoelectric properties.
dc.format.mediumborn digital
dc.format.mediummasters theses
dc.identifierCramer_colostate_0053N_12815.pdf
dc.identifier.urihttp://hdl.handle.net/10217/166863
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartof2000-2019
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.subjectsuperlattice
dc.subjectthin-film
dc.subjectthermoelectric
dc.subjectSi/SiC
dc.titleThermoelectric properties of Si/SiC thin-film superlattices grown by ion beam sputtering
dc.typeText
dcterms.rights.dplaThis Item is protected by copyright and/or related rights (https://rightsstatements.org/vocab/InC/1.0/). You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).
thesis.degree.disciplineMechanical Engineering
thesis.degree.grantorColorado State University
thesis.degree.levelMasters
thesis.degree.nameMaster of Science (M.S.)

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