Part I, Access to UV photocured nanostructures via selective morphological trapping of block copolymer melts. Part II, Morphological phase behavior of poly(RTIL) containing block copolymer melts
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A thermally stable photocuring system was developed for high fidelity translation of block copolymer based melt-state morphologies into their equivalent solid analogs. Cationic photoacids were combined with partially epoxidized polyisoprene-b-poly(ethylene oxide) (PI-PEO) block copolymers, forming composite blends that allow for extended thermal processing prior to cure, in addition to precise trapping of selected morphologies, a consequence of the temperature independent UV curing mechanism. The parent PI-PEO block copolymer exhibited multiple melt-state morphologies including crystalline ...