Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

Rocca, Jorge J., author; Menoni, Carmen S., author; Parkinson, Bruce Alan, author; Lu, Yunfeng, author; Pietrasanta, L., author; Ludueña, S., author; Marconi, Mario Carlos, author; Grisham, Michael Eric, author; Vaschenko, Georgiy O., author; Capeluto, Maria G., author; IEEE, publisher

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

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ECEmcm00024.pdf (1.41 MB)

Date

2006

Authors

Rocca, Jorge J., author

Menoni, Carmen S., author

Parkinson, Bruce Alan, author

Lu, Yunfeng, author

Pietrasanta, L., author

Ludueña, S., author

Marconi, Mario Carlos, author

Grisham, Michael Eric, author

Vaschenko, Georgiy O., author

Capeluto, Maria G., author

Abstract

We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.

Subject

nanotechnology

photolithography

x-ray lasers

x-ray lithography

URI

http://hdl.handle.net/10217/2128

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Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

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